高纯磷化铟衬底与外延材料供应商

High-Quality Indium Phosphide Substrate Supplier

// 02 · APPLICATIONS

Applications

From 800G backbone optical transceivers and 6G mmWave front-ends to automotive LiDAR and frontier quantum devices, InP is defining the boundaries of next-generation semiconductors.

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High-Speed Optical Communication
01
Optical Communication

High-Speed Optical Communication

High-speed optical transceivers for AI data centers (800G/1.6T/CPO), long-haul fiber transmission, and 5G/6G optical fronthaul; used for DFB lasers, EML modulators, photodetectors, and photonic integrated circuits (PIC), compatible with the 1310/1550 nm fiber communication windows.

DFBEMLAPDSOA
mmWave RF & Satellite/Space Communications
02
Aerospace Communication

mmWave RF & Satellite/Space Communications

InP HEMT/HBT high-frequency transistors with low noise and high electron mobility; used in LEO satellite payloads, on-board RF amplifiers, mmWave communication, airborne phased-array radar, and electronic warfare, with strong radiation tolerance for space environments.

HBTHEMTPAmmWave
LiDAR & Optoelectronic Sensing
03
Lidar and Optical Sensing

LiDAR & Optoelectronic Sensing

Focused on 1550 nm eye-safe automotive LiDAR, plus space laser communication, ranging, infrared detection, and single-photon detection; the mainstream substrate solution for high-end LiDAR light sources and receiver chips.

SWIRLiDARFPASensing
Quantum Devices
04
Aerospace Special Devices

Space-Grade Devices & Frontier Photonics

Space-grade high-efficiency multi-junction solar cells (space photovoltaics), plus quantum photonics (QKD, single-photon sources), terahertz imaging and inspection, and other frontier research and specialty equipment applications.

QD LaserSPSQKDCryo
// 03 · PRODUCT FINDER

Product Finder

Filter InP substrates by size, doping, and resistivity, with real-time specifications and availability.

Model
Size
Doping
Availability
InP 2" Substrate
Size:2"
Doping:S-doped (n-type)
InP 3" Substrate
Size:3"
Doping:S-doped (n-type)
InP 4" Substrate
Size:4"
Doping:S-doped (n-type)
InP 6" Substrate
Size:6"
Doping:S-doped (n-type)
InP 2" Substrate
Size:2"
Doping:Fe-doped (semi-insulating)
InP 3" Substrate
Size:3"
Doping:Fe-doped (semi-insulating)
InP 4" Substrate
Size:4"
Doping:Fe-doped (semi-insulating)
InP 6" Substrate
Size:6"
Doping:Fe-doped (semi-insulating)
// 04 · CAPABILITY

Technology

From cleanroom facilities and a specialized team to volume yield and quality systems, we deliver stable, reliable industrialization for InP substrate manufacturing.

Semiconductor Cleanroom
CLEANROOM · CLASS 100
16,000 m² · 24/7 production
FAB
01 / 04

Class 100 Cleanroom

16,000 m² semiconductor cleanroom with ultrapure water treatment, meeting the stringent process environment requirements of compound semiconductor wafer manufacturing.

KEY METRIC Class 100
R&D
02 / 04

Technical Team

A senior team with deep experience in compound semiconductors and wafer equipment; R&D staff account for over 40%, with 20+ years of average industry experience.

KEY METRIC R&D Staff 40%
CAP
03 / 04

Capacity & Yield

Stable high-volume substrate production lines running at 300,000 wafers per year, with industry-leading batch consistency and yield.

KEY METRIC 300,000 Wafers/Year
ISO
04 / 04

Certifications

ISO 9001 / ISO 14001, approved under customer qualified supplier systems, with full-process quality traceability.

KEY METRIC ISO 14001
Xinguangyuan Facility
EST. 2026 · Qidong, Nantong
16,000 m² modern production facility
// 05 · ABOUT US

Company Overview

江苏芯光元晶体技术有限公司于2026年3月在江苏南通启东正式注册成立,专注于磷化铟衬底研发与制造。公司汇聚深耕化合物半导体、晶圆设备领域的资深技术团队,研发人员占比超40%。

企业拥有16000㎡ 现代化生产厂房,配套高等级半导体洁净生产车间,搭载专业超纯水处理系统,满足化合物半导体晶圆制造严苛工艺要求;现已建成规模化衬底量产产线,目前年产量可达30万片。

依托长三角成熟的半导体产业集群优势,企业聚焦光通信、射频半导体核心赛道,坚持自主技术突破,致力于打造国产化晶体材料与晶圆装备供应链,为国内半导体产业链提供高可靠国产配套方案,助力行业实现核心环节自主可控。

40%
R&D Staff Ratio
20+ years
Average Industry Experience
16,000 m²
Facility Area
25,000 wafers
Monthly Capacity
// 06 · NEWS

News

Company news, product launches, and industry insights, keeping you up to date on our latest InP developments.

// 07 · MATERIAL

Indium Phosphide (InP)

Indium Phosphide · Substrate & Epi

The material of choice for high-speed optical communication, AI data center interconnects, and advanced sensing applications.

Sizes
2" 3" 4" 6"
Doping
S-doped (n-type) Fe-doped n-type Semi-Insulating
Applications
Optical Transceivers Co-Packaged Optics (CPO) Silicon Photonics High-Speed Lasers & Photodetectors 5G & Telecom Infrastructure Autonomous Driving Sensing
// 08 · CONTACT

Contact Technical Sales

Tell us your requirements and our technical team will respond within one business day with samples and customized solutions.

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